Deposition and Characterization of Thin Si-B-C-N Films by DC Reactive Magnetron Sputtering of Composed Si/B4C Target
Author:
Publisher
Allerton Press
Subject
Inorganic Chemistry,General Materials Science
Link
http://link.springer.com/content/pdf/10.3103/S1063457619020035.pdf
Reference34 articles.
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3. Thärigen, T., Lippold, G., Riede, V., Lorenz, M., Koivusaari, K.J., Lorenz, D., Mosch, S., Grau, P., Hesse, R., Streubel, P., and Szargan, R., Hard amorphous CSixNy thin films deposited by RF nitrogen plasma assisted pulsed laser ablation of mixed graphite/Si3N4 targets, Thin Solid Films, 1999, vol. 348, pp. 103–113.
4. Sundaram, K.B. and Alizadeh, J., Deposition and optical studies of silicon carbide nitride thin films, Thin Solid Films, 2000, vol. 370, pp. 151–154.
5. Wu, X.C., Cai, R.Q., Yan, P.X., Liu, W.M., and Tian, J., SiCN thin films prepared at room temperature by r.f. reactive sputtering, Appl. Surf. Sci., 2002, vol. 185, pp. 262–266.
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1. Directional Formation of Reactive Oxygen Species Via a Non‐Redox Catalysis Strategy That Bypasses Electron Transfer Process;Advanced Materials;2024-05-23
2. Preparation and Performance of Multilayer Si-B-C-N/Diamond-like Carbon Gradient Films;Materials;2023-02-16
3. Multilayer PECVD Si–C–N Films;Springer Proceedings in Physics;2020
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