Protectiveness of CVD Al<sub>2</sub>O<sub>3</sub> Films Against High-Temperature Oxidation-Reference-Cited by-同舟云学术

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Protectiveness of CVD Al₂O₃ Films Against High-Temperature Oxidation

Published:1988 Issue:12 Volume:37 Page:745-750
ISSN:0010-9355
Container-title:CORROSION ENGINEERING
language:en
Short-container-title:

Author:

Taniguchi Shigeji¹,Shibata Toshio¹,Horikawa Yoshihiko¹

Affiliation:

1. Faculty of Engineering, Osaka University

Publisher

Japan Society of Corrosion Engineering

Subject

General Engineering,General Materials Science

Link

https://www.jstage.jst.go.jp/article/jcorr1974/37/12/37_12_745/_pdf

Reference11 articles.

1. 1) R. Funk, H. Schachner, C. Triquet, M. Kornmann & B. Lux: J. Electrochem. Soc., 123, 285 (1976).

2. 2) W. A. Bryant: J. Mat. Sci., 12, 1285 (1977).

3. 3) R. F. Bunshah: J. Vac. Sci. Technol., B2, 789 (1984).

4. 4) M. J. Bennett: J. Vac. Sci. Technol., B2, 800 (1984).

5. 6) J. N. Lindstrom & R. T. Johannesson: J. Electrochem. Soc., 123, 555 (1976).

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Protectiveness of a CVD-Al₂O₃ Film on TiAl Intermetallic Compound against High-Temperature Oxidation;Materials Transactions, JIM;1991

2. Protectiveness of CVD Al₂O₃ Films on TiN against High-Temperature Oxidation;Materials Transactions, JIM;1990

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