Protectiveness of a CVD-Al2O3 Film on TiAl Intermetallic Compound against High-Temperature Oxidation
Author:
Affiliation:
1. Department of Materials Science and Processing, Faculty of Engineering, Osaka University
2. Undergraduate Student, Osaka University
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/32/3/32_3_299/_pdf
Reference13 articles.
1. 1) H. A. Lipsitt, D. Shechtman and R. E. Schafrik: Met. Trans., 6A (1975), 1991.
2. 2) T. Kawabata, T. Kanai and O. Izumi: Acta Met., 33 (1985), 1355.
3. 3) R. A. Perkins, K. T. Chiang and G. H. Meyer: Scrip. Met., 21 (1987), 1505.
4. 4) K. Kasahara, K. Hashimoto, H. Doi and T. Tsujimoto: J. Japan Inst. Metals, 53 (1989), 58.
5. 5) Y. Umakoshi, M. Yamaguchi, T. Sakagami and T. Yamane: J. Mater. Sci., 24 (1989), 1599.
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