Impact of interface traps on gate-induced drain leakage current inn-type metal oxide semiconductor field effect transistor
Author:
Publisher
Informa UK Limited
Subject
Electrical and Electronic Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00207210500092677
Reference63 articles.
1. Lateral distribution of hot-carrier-induced interface traps in MOSFETs
2. Banerjee S Colman J Richardson B Shah AProc. VLSI Symp.1987 p. 97
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4. Modelling of gate-induced drain leakage in relation to technological parameters and temperature
5. Interfacial electronic traps in surface controlled transistors
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