Studies of ferroelectric film growth and capacitor interface processes viainsituanalytical techniques and correlation with electrical properties-Reference-Cited by-同舟云学术

Studies of ferroelectric film growth and capacitor interface processes viainsituanalytical techniques and correlation with electrical properties

Published:2001-01 Issue:1-4 Volume:32 Page:121-131
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Krauss Alan R.¹,Auciello Orlando²,Dhote Anil M.¹³,Im Jaemo²,Aggarwal Sanjeev³,Ramesh Ramamoorthy³,Irene Eugene A.⁴,Gao Ying⁴,Mueller Alex H.⁴

Affiliation:

1. a Argonne National Laboratory, Materials Science and Chemistry Divisions , Argonne , IL , 60439

2. b Argonne National Laboratory, Materials Science Division , Argonne , IL , 60439

3. c University of Maryland, Department of Materials and Nuclear Engineering , College Park , MD , 20742

4. d University of North Carolina, Department of Chemistry , Chapel Hill , NC , 27599

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584580108215683

Reference9 articles.

1. Paz de Araujo , C. A. Auciello , O. and Ramesh , R. 2000. “Science and Technology of Integrated Ferroelectric: Selected Papers Eleven Years of ISIF Proceedings”. Edited by: Paz de Araujo , C. A. Auciello , O. and Ramesh , R. Gordon and Breach. in press. Also, many articles in the same book

2. Combined Spectroscopic Ellipsometry and Ion Beam Surface Analysis for In-Situ Real-Time Characterization of Complex Oxide Film Growth

3. In situ study of interface reactions of ion beam sputter deposited (Ba0.5Sr0.5)TiO3 films on Si, SiO2, and Ir

4. Summerfelt , S. R. 1997. “Ferroelectric Thin Films”. Edited by: Ramesh , R. p. 1Kluwer Academic, The Netherlands. Ch 1

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