Comparison of the Ferroelectricity for 70–80 nm Thick Pb(Zr,Ti)O3 Films Deposited on (111)Ir Bottom Electrodes at Different Temperatures by MOCVD
Author:
Affiliation:
1. a Department of Innovative and Engineered Materials, Tokyo Institute of Technology , Yokohama, Japan , 226-8502
2. b Department of Material Systems Engineering and Life Science, Toyama University , 3190 Gofuku, Toyama, Japan , 930-8555
Publisher
Informa UK Limited
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/10584580490895851
Reference22 articles.
1. An experimental 512-bit nonvolatile memory with ferroelectric storage cell
2. Ferroelectric Memories
3. A 0.4-/spl mu/m 3.3-V 1T1C 4-Mb nonvolatile ferroelectric RAM with fixed bitline reference voltage scheme and data protection circuit
4. A 3.3-V, 4-Mb nonvolatile ferroelectric RAM with selectively driven double-pulsed plate read/write-back scheme
5. A 0.5-/spl mu/m, 3-V 1T1C, 1-Mbit FRAM with a variable reference bit-line voltage scheme using a fatigue-free reference capacitor
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Comparison of PbZr1−xTixO3 thin films deposited on different substrates by liquid delivery metal organic chemical vapor deposition;Journal of Applied Physics;2009-03-15
2. FABRICATION AND PROPERTIES OF METAL-PZT-METAL CAPACITORS BY LIQUID DELIVERY MOCVD;Integrated Ferroelectrics;2008-12-09
3. Effect of source materials on film thickness and compositional uniformity of MOCVD-P(Zr,Ti)O3 films;Surface and Coatings Technology;2007-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3