Characteristics of Pb(Zr, Ti)O3thin films prepared on various substrates by source gas pulse-introduced metalorganic chemical vapor deposition
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://www.tandfonline.com/doi/pdf/10.1080/00150190108015996
Reference6 articles.
1. Common and unique aspects of perovskite thin film CVD processes
2. Improvement of Property of Pb(ZrxTi1-x)O3 Thin Film Prepared by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition
3. Formation of Epitaxial Pb(Zr, Ti)O3 Film by CVD
4. Composition Control of Pb(ZrxTi1-x)O3Thin Films Prepared by Metalorganic Chemical Vapor Deposition
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High-quality single crystal growth of Bi-based perovskite ferroelectrics based on defect chemistry;Journal of the Ceramic Society of Japan;2008
2. Highly textured Pb(Zr0.3Ti0.7)O3 thin films on GaN/sapphire by metalorganic chemical vapor deposition;Journal of Materials Research;2006-06-01
3. Substrate effect on the crystal structure and ferroelectricity of low-temperature-deposited Pb(Zr, Ti)O3 thin films by metalorganic chemical vapor deposition;Applied Physics Letters;2003-06-09
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