The angular dependence of the sputter yield maxima
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577608243040
Reference32 articles.
1. THE INFLUENCE OF CHANNELING ON Cu SINGLE‐CRYSTAL SPUTTERING
2. Precision measurements on the angular and temperature dependence of sputtering
3. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
4. Untersuchungen zur Festkörperzerstäubung bei schiefwinkligem Ionenbeschuß polykristalliner Metalloberflächen im Energiebereich um 1 keV
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