The Application of Berg-Barrett Skew Reflections for Observing Boron Diffusion-induced Imperfections in Silicon Wafers †-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The Application of Berg-Barrett Skew Reflections for Observing Boron Diffusion-induced Imperfections in Silicon Wafers †

Published:1966-03 Issue:3 Volume:20 Page:273-288
ISSN:0020-7217
Container-title:International Journal of Electronics
language:en
Short-container-title:International Journal of Electronics

Author:

JULEFF E. M.,LAPIERRE A. G.

Publisher

Informa UK Limited

Subject

Electrical and Electronic Engineering

Link

http://www.tandfonline.com/doi/pdf/10.1080/00207216608937866

Reference10 articles.

1. JAMES , R. W. , 1954 ,The Optical Principles of the Diffraction of X-rays( London G. Bell & Sons, Ltd .), p. 60 .

2. Measurement of Flexure in Silicon Wafers by the Lang X-ray Diffraction Technique†

3. Direct Observation of Individual Dislocations by X‐Ray Diffraction

4. X‐Ray Diffraction Analyses and Etch Patterns of Faults in Epitaxial Silicon

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Röntgentopographie;Handbuch Festkörperanalyse mit Elektronen, Ionen und Röntgenstrahlen;1979

2. TECHNIQUES AND INTERPRETATION IN X-RAY TOPOGRAPHY;Diffraction and Imaging Techniques in Material Science;1978

3. X-Ray Topography;Epitaxial Growth;1975

4. Röntgentopographie von gekrümmten Halbleiterscheiben;Kristall und Technik;1972

5. DIRECT VIDEO IMAGING OF X‐RAY TOPOGRAPHS;Applied Physics Letters;1969-06-15

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP