Generation of Charged Nanoparticles During the Synthesis of GaN Nanostructures by Atmospheric-Pressure Chemical Vapor Deposition
Author:
Publisher
Informa UK Limited
Subject
Pollution,General Materials Science,Environmental Chemistry
Link
http://www.tandfonline.com/doi/pdf/10.1080/02786826.2012.693977
Reference73 articles.
1. Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO2Films Using Tetraethylorthosilicate (TEOS)
2. Particle Generation and Film Formation in an Atmospheric-Pressure Chemical Vapor Deposition Reactor Using the Tetraethylorthosilicate (TEOS)/He, TEOS/O2/He, and TEOS/O3/He Systems
3. Particle generation and film formation in an atmospheric-pressure chemical vapour deposition process using tetraethylorthosilicate
4. Morphology Control of Films Formed by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethylorthosilicate/Ozone System
5. Observation of carbon clusters of a few nanometers in the oxyacetylene diamond CVD process
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