Electrodes for ferroelectric thin films-Reference-Cited by-同舟云学术

Electrodes for ferroelectric thin films

Published:1993-12 Issue:4 Volume:3 Page:321-332
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Al-Shareef H. N.¹,Gifford K. D.¹,Rou S. H.¹,Hren P. D.¹,Auciello O.¹²,Kingon A. I.¹

Affiliation:

1. a Department of Materials Science and Engineering , North Carolina State University , Raleigh, North Carolina, 27695, USA

2. b MCNC, Center for Microelectronic Systems Technology , Research Triangle Park, North Carolina, 27709-2889, USA

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584589308216687

Reference22 articles.

1. Presented at the 4th International Symposium on Integrated Ferroelectrics;Bernstein S. D.,1992

2. Bottom electrodes for integrated Pb(Zr, Ti)O3 films

3. Aluminum films deposited by rf sputtering

4. Hillock Growth and Stress Relief in Sputtered Au Films

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