Sputtering Pattern Distortions on Plane and Cylindrical Collectors Deposit Structure of Aluminium Pattern between 100 and 560°K-Reference-Cited by-同舟云学术

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Sputtering Pattern Distortions on Plane and Cylindrical Collectors Deposit Structure of Aluminium Pattern between 100 and 560°K

Published:1968-08 Issue:152 Volume:18 Page:269-280
ISSN:0031-8086
Container-title:Philosophical Magazine
language:en
Short-container-title:Philosophical Magazine

Author:

Schulz F.,Sizmann R.

Publisher

Informa UK Limited

Link

http://www.tandfonline.com/doi/pdf/10.1080/00318086.1968.11716230

Reference15 articles.

1. Atom Ejection in Low Energy Sputtering of Single Crystals of fcc Metals and of Ge and Si

2. Atom Ejection Patterns in Single‐Crystal Sputtering

3. Ion Bombardment of Single Crystals of Aluminum

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3. Angular Distribution of Molecules Sputtered by Gas Cluster Ion Beams and Implications for Secondary Neutral Mass Spectrometry;The Journal of Physical Chemistry C;2016-11-02

4. Experiment combining ion-beam sputtering and quantitative ICP-OES analysis: angular distributions and total yield of titanium sputtered by 5 keV krypton ions;Applied Surface Science;2004-03

5. Low-energy Ar+ ion induced angularly resolved Al(100) and Al(110) sputtering measurements;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-11

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