Effect of Surface Microstructure on the Oxidation Stability of Cu3N Thin Film
Author:
Affiliation:
1. a Plasma Physics Research Center, Science and Research Branch , Islamic Azad University , Tehran , Iran
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
https://www.tandfonline.com/doi/pdf/10.1080/15421406.2013.766944
Reference18 articles.
1. Synthesis and characterization of Cu3N–WC nanocomposite films prepared by direct current magnetron sputtering
2. Structural and optical properties of copper nitride thin films in a reactive Ar/N2magnetron sputtering system
3. Experimental study of the electrical properties of copper nitride thin films prepared by dc magnetron sputtering
4. Effect of N2-Gas Partial Pressure on the Structure and Properties of Copper Nitride Films by DC Reactive Magnetron Sputtering
5. Effect of post deposition annealing on the optical properties of HfOxNy films
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1. Influence of substrate temperatures on the microstructural, morphological, and optoelectronic characteristics of Cu3N/ITO thin films intended for solar cell applications;Journal of Materials Science: Materials in Electronics;2024-07
2. Exploring the impact of substrate placement on Cu3N thin films as a solar cell window layer: Structural and optical attributes;Materials Today Communications;2023-06
3. Oxidation of Cu3N thin films obtained from Cu annealed under NH3:O2 flow: A Raman and N-K-edge NEXAFS study;Journal of Alloys and Compounds;2022-09
4. Oxidation behavior of copper nitride thin films deposited by direct current magnetron sputtering;Journal of Materials Science: Materials in Electronics;2021-10-19
5. Impact of Oxygen on the Properties of Cu3N and Cu3–xN1–xOx;The Journal of Physical Chemistry C;2021-02-11
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