Hydrogen stability in amorphous germanium films-Reference-Cited by-同舟云学术

Hydrogen stability in amorphous germanium films

Published:1991-01 Issue:1 Volume:63 Page:269-279
ISSN:1364-2812
Container-title:Philosophical Magazine B
language:en
Short-container-title:Philosophical Magazine B

Author:

Beyer W.¹,Herion J.¹,Wagner H.¹,Zastrow U.¹

Affiliation:

1. a Institut für Schicht- und Ionentechnik , Forschungszentrum Jülich , D-5170 , Jülich , F.R. Germany

Publisher

Informa UK Limited

Subject

General Physics and Astronomy,General Chemical Engineering

Link

https://www.tandfonline.com/doi/pdf/10.1080/01418639108224444

Reference22 articles.

1. Hydrogen Incorporation in Amorphous Silicon and Processes of Its Release

2. Beyer , W. Herion , J. Mell , H. and Wagner , H. 1988. Amorphous Silicon Technology, Edited by: Madan , A. Thompson , M. J. Taylor , P. C. and Le Comber , P. G. 291Pittsburgh, Pennsylvania: Materials Research Society.

3. Fermi energy dependence of surface desorption and diffusion of hydrogen in a-Si:H

4. Comparative study of hydrogen evolution from amorphous hydrogenated silicon films

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