Diffusion processes in germanium and silicon films grown on Si3N4 substrates
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
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1. DIFFUZIYa ATOMOV VODORODA IZ DIELEKTRIChESKIKh PODLOZhEK Si3N4 V AMORFNYE I POLIKRISTALLIChESKIE PLENKI Si I Ge;Журнал экспериментальной и теоретической физики;2024-12-15
2. Effect of extended defects on phonon confinement in polycrystalline Si and Ge films;Materials Science in Semiconductor Processing;2024-10
3. Near infrared photo-response of as-deposited films based on GeSn nanoparticles in Si3N4 dielectric;2023 International Semiconductor Conference (CAS);2023-10-11
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