Chemical trends in lattice location of implanted impurities in silicon
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337578608207481
Reference26 articles.
1. Ion Implantation Range and Energy Deposition Distributions
2. Kimerling, L. C. and Poate, J. M. 1975.Lattice Defects in Semiconductors, Conf. Ser. No. 23 126London: The Institute of Physics. and references therein.
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