Performance assessment of run-to-run control in semiconductor manufacturing based on IMC framework-Reference-Cited by-同舟云学术

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Performance assessment of run-to-run control in semiconductor manufacturing based on IMC framework

Published:2009-05-15 Issue:15 Volume:47 Page:4173-4199
ISSN:0020-7543
Container-title:International Journal of Production Research
language:en
Short-container-title:International Journal of Production Research

Author:

Chen Liang¹,Ma Mingda²,Jang Shi-Shang³,Wang David Shan-Hill³,Wang Shuqing¹

Affiliation:

1. a State Key Laboratory of Industrial Control Technology , Institute of Advanced Process Control , Zhejiang University, Hangzhou, China

2. b Center for Control and Guidance Technology , Harbin Institute of Technology , Harbin, China

3. c Department of Chemical Engineering , National Tsing-Hua University , Hsin-Chu, Taiwan

Publisher

Informa UK Limited

Subject

Industrial and Manufacturing Engineering,Management Science and Operations Research,Strategy and Management

Link

https://www.tandfonline.com/doi/pdf/10.1080/00207540802029633

Reference32 articles.

1. Extensions and performance/robustness tradeoffs of the EWMA run-to-run controller by using the internal model control structure

2. Run-to-run control and performance monitoring of overlay in semiconductor manufacturing

3. Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry

4. Run-to-Run Process Control: Literature Review and Extensions

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