Run-to-run control and performance monitoring of overlay in semiconductor manufacturing-Reference-Cited by-同舟云学术

Run-to-run control and performance monitoring of overlay in semiconductor manufacturing

Published:2004-07 Issue:7 Volume:12 Page:893-900
ISSN:0967-0661
Container-title:Control Engineering Practice
language:en
Short-container-title:Control Engineering Practice

Author:

Bode C.A.,Ko B.S.,Edgar T.F.

Publisher

Elsevier BV

Subject

Applied Mathematics,Electrical and Electronic Engineering,Computer Science Applications,Control and Systems Engineering

Reference8 articles.

1. Bode, C. A. (2001). Run-to-run control of overlay and linewidth in semiconductor manufacturing. Ph.D. Dissertation, University of Texas, Austin, TX.

2. A statistical approach to quality control of non-normal lithographical overlay distributions;Booth;IBM Journal of Research and Development,1992

3. Campbell, J. (1999). Model predictive run-to-run control of chemical mechanical planarization. Ph.D. Dissertation, University of Texas, Austin, TX.

4. Edgar, T. F., Campbell, W. J., & Bode, C. A. (1999). Model-based control in microelectronics manufacturing. In Proceedings of the 38th conference on decision and control, Vol. 4, IEEE Control Systems Society, Phoenix, AZ. (pp. 4185–4192).

5. Assessment of control loop performance;Harris;Canadian Journal of Chemical Engineering,1989

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