Characteristics of Substrate Current in Magnetron Sputtering of Nickel with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma
Author:
Publisher
The Vacuum Society of Japan
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics
Reference4 articles.
1. 1) 小林春洋, 細川直吉 : 部品.デバイスのための薄膜技術入門, (総合電子出版社, 東京, 1992) 209.
2. Fundamental characteristics of built‐in high‐frequency coil‐type sputtering apparatus
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Effect of Ion Irradiation for Ni Films prepared on a Flexible Substrate Material Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma;Journal of the Vacuum Society of Japan;2015
2. Effect of Substrate Bipolar Pulse Voltage on the Properties of Cu Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma;Journal of the Vacuum Society of Japan;2010
3. Dependence of Substrate DC Bias Voltage on Structural Properties of Nickel Thin Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma;Shinku;2006
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