Dependence of Substrate DC Bias Voltage on Structural Properties of Nickel Thin Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma-Reference-Cited by-同舟云学术

Dependence of Substrate DC Bias Voltage on Structural Properties of Nickel Thin Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Published:2006 Issue:3 Volume:49 Page:156-158
ISSN:0559-8516
Container-title:Shinku
language:
Short-container-title:J. Vac. Soc. Jpn.

Author:

TAKESAKO Kazuaki,OKAYAMA Yuta,KAWABATA Keishi

Publisher

The Vacuum Society of Japan

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics

Reference8 articles.

1. 1) (社)応用物理学会,薄膜.表面物理分科会:薄膜作製ハンドブック,(共立出版株式会社,東京.1991)91.

2. Growth and structure of Ni films radio frequency sputter deposited on GaAs(001) covered with Ti film

3. Epitaxial growth of Ni films by radio frequency sputtering on GaAs(001) with a TiN buffer

4. 4) 小林春洋,細川直吉:部品.デバイスのための薄膜技術入門,(総合電子出版社,東京.1992)209.

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