1. In Plasma ion beam analysis of polymer layer and adsorbed H monolayer etching;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2024-09
2. Cost-Effective Fabrication of Inner-Porous Micro/Nano Carbon Structures;Journal of Nanoscience and Nanotechnology;2018-03-01
3. High-aspect-ratio patterning by ClF3-Ar neutral cluster etching;Microelectronic Engineering;2015-06
4. Three-dimensional nanochannels formed by fast etching of polymer;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006
5. Etching with electron beam generated plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2004-11