Etching with electron beam generated plasmas-Reference-Cited by-同舟云学术

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Etching with electron beam generated plasmas

Published:2004-11 Issue:6 Volume:22 Page:2276-2283
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Leonhardt D.,Walton S. G.,Muratore C.,Fernsler R. F.,Meger R. A.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1795827

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of a dielectric cavity on the ion etching of dielectrics by electron beam-produced plasma generated by a forevacuum plasma electron source;Vacuum;2021-10

2. Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films;Journal of Vacuum Science & Technology A;2021-05

3. Local ion-plasma etching of dielectrics initiated and controlled by the electron beam in fore-vacuum pressure range;Vacuum;2020-10

4. Initial stage of beam-generated plasma with evaporating electrode;Physics of Plasmas;2020-02

5. An experimental test-stand for investigation of electron-beam synthesis of dielectric coatings in medium vacuum pressure range;Vacuum;2019-05

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