Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources-Reference-Cited by-同舟云学术

Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources

Published:2017-01 Issue:1 Volume:35 Page:01B117
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Franke Sebastian,Baumkötter Matthias,Monka Carsten,Raabe Sebastian,Caspary Reinhard,Johannes Hans-Hermann,Kowalsky Wolfgang,Beck Sebastian,Pucci Annemarie,Gargouri Hassan¹

Affiliation:

1. SENTECH Instruments GmbH, Schwarzschildstr. 2, 12489 Berlin, Germany

Funder

Bundesministerium für Bildung und Forschung (BMBF)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4971173

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