Spatial density of lines exposed in poly(methylmethacrylate) by electron beam lithography
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.578417
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Fabrication Variations and Defect Tolerance for Nanomagnet-Based QCA;2008 IEEE International Symposium on Defect and Fault Tolerance of VLSI Systems;2008-10
2. E-beam lithography and electrodeposition fabrication of thick nanostructured devices;Journal of Physics D: Applied Physics;2007-05-04
3. Nanoscale resist morphologies of dense gratings using electron-beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007
4. Megasonic-assisted development of nanostructures;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006
5. Megasonic-assisted development of nanostructures: Investigations on high aspect ratio nanoholes;Applied Physics Letters;2004-11-22
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