Megasonic-assisted development of nanostructures-Reference-Cited by-同舟云学术

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Megasonic-assisted development of nanostructures

Published:2006 Issue:4 Volume:24 Page:1827
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Küpper David,Küpper Daniel,Wahlbrink Thorsten,Bolten Jens,Lemme Max C.,Georgiev Yordan M.,Kurz Heinrich

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. New Generation Electron Beam Resists: A Review;Chemistry of Materials;2017-02-27

3. Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method;Beilstein Journal of Nanotechnology;2015-04-17

4. Characterisation of a novel electron beam lithography resist, SML and its comparison to PMMA and ZEP resists;Microelectronic Engineering;2014-07

5. Chemistry and processing of resists for nanolithography;Nanolithography;2014

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