High-resolution electron beam lithography with negative organic and inorganic resists-Reference-Cited by-同舟云学术

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High-resolution electron beam lithography with negative organic and inorganic resists

Published:1988-11 Issue:6 Volume:6 Page:2298
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Bernstein G. H.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-06-02

2. The world of nanoelectronics;Transport in Semiconductor Mesoscopic Devices;2014

3. Photostimulated etching of germanium chalcogenide films;Semiconductor Physics Quantum Electronics and Optoelectronics;2012-12-12

4. Photoinduced etching of thin films of chalcogenide glassy semiconductors;Semiconductors;2012-04

5. On the mechanism of gray scale patterning of Ag-containing As2S3 thin films;Journal of Physics and Chemistry of Solids;2007-05

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