Area-selective atomic layer deposition of cobalt oxide to generate patterned cobalt films
Author:
Affiliation:
1. McKetta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712
2. Lam Research Corp., Austin, Texas 78753
Funder
National Science Foundation
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5066437
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3. Area selective atomic layer deposition of SnO2 as an etch resist in fluorine based processes;Journal of Vacuum Science & Technology A;2023-03-13
4. Low temperature, area-selective atomic layer deposition of NiO and Ni;Journal of Vacuum Science & Technology A;2022-12
5. Fabrication of High-? Dielectric Metal Oxide Films on Topographically Patterned Substrates: Polymer Brush-Mediated Depositions;ACS APPL MATER INTER;2022
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