Structure of fluorine-doped silicon oxide films deposited by plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Structure of fluorine-doped silicon oxide films deposited by plasma-enhanced chemical vapor deposition

Published:1997-11 Issue:6 Volume:15 Page:2908-2914
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Yoshimaru M.,Koizumi S.,Shimokawa K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580884

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