Influence of negative ion resputtering on ZnO:Al thin films-Reference-Cited by-同舟云学术

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Influence of negative ion resputtering on ZnO:Al thin films

Published:2004-01 Issue:1 Volume:22 Page:20-29
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Rieth Loren W.,Holloway Paul H.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1626641

Cited by 38 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect and mechanism of bias voltage on microstructure and corrosion resistance of CrxNy coatings in proton-exchange membrane fuel cells;Vacuum;2024-08

2. The measurement and impact of negative oxygen ions during reactive sputter deposition;Critical Reviews in Solid State and Materials Sciences;2023-09-21

3. Investigation of carrier transport in ZnO and ZnO:Al thin films sputtered at different oxygen conditions;Thin Solid Films;2023-09

4. Comparative Study of Aluminum-Doped Zinc Oxide, Gallium-Doped Zinc Oxide and Indium-Doped Tin Oxide Thin Films Deposited by Radio Frequency Magnetron Sputtering;Nanomaterials;2022-05-02

5. Dependence of the Generation Behavior of Charged Nanoparticles and Ag Film Growth on Sputtering Power during DC Magnetron Sputtering;Electronic Materials Letters;2021-01-13

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