Real-time, in situ film thickness metrology in a 10 Torr W chemical vapor deposition process using an acoustic sensor
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007
2. In situ chemical sensing in AlGaN∕GaN metal organic chemical vapor deposition process for precision film thickness metrology and real-time advanced process control;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005
3. Real-time material quality prediction, fault detection, and contamination control in AlGaN∕GaN high electron mobility transistor metalorganic chemical vapor deposition process using in situ chemical sensing;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005
4. In situ chemical sensing in AlGaN∕GaN high electron mobility transistor metalorganic chemical vapor deposition process for real-time prediction of product crystal quality and advanced process control;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005
5. Real-time acoustic sensing and control of metalorganic chemical vapor deposition precursor concentrations delivered from solid phase sources;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2004-09
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