Penning type magnetron sputtering source and its use in the production of carbon nitride coatings-Reference-Cited by-同舟云学术

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Penning type magnetron sputtering source and its use in the production of carbon nitride coatings

Published:1999-01 Issue:1 Volume:17 Page:62-69
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Murphy M. J.,Monaghan J.,Tyrrell M.,Walsh R.,Cameron D. C.,Chowdhury A. K. M. S.,Monclus M.,Hashmi M. S. J

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581551

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pulsed dc operation of a Penning-type opposed target magnetron;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2005-01

2. Hybrid PIG–ECR discharge as low-pressure sputtering system;Vacuum;2004-06

3. Facing-target magnetron operation for the deposition of CNx thin films;Surface and Coatings Technology;2003-09

4. Study of the plasma produced from laser ablation of a KTP crystal;Applied Surface Science;2003-02

5. Effect of plasma parameters on the structure of CN layers deposited by DC magnetron sputtering;Diamond and Related Materials;2002-03

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