Pulsed dc operation of a Penning-type opposed target magnetron
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.1828086
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Mechanisms of the structural modification of Ti films by pulsed direct current and inductively coupled plasma-assisted pulsed direct current sputtering;Thin Solid Films;2017-07
2. Ion fluxes in medium frequency pulsed DC magnetron sputtering;Surface and Coatings Technology;2010-07
3. Effect of pulse frequency on the ion fluxes during pulsed dc magnetron sputtering;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-03
4. Spatially-resolved optical emission from a bi-polar pulsed DC magnetron discharge;Surface and Coatings Technology;2008-11
5. Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti–Al–Y–N thin films;Surface and Coatings Technology;2008-10
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