Mechanisms of the structural modification of Ti films by pulsed direct current and inductively coupled plasma-assisted pulsed direct current sputtering-Reference-Cited by-同舟云学术

Mechanisms of the structural modification of Ti films by pulsed direct current and inductively coupled plasma-assisted pulsed direct current sputtering

Published:2017-07 Issue: Volume:634 Page:73-84
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kusano Eiji,Kikuchi Naoto

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference62 articles.

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4. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings;Thornton;J. Vac. Sci. Technol.,1974

5. Investigations of titanium oxide films deposited by d.c. reactive magnetron sputtering in different sputtering pressures;Meng;Thin Solid Films,1993

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