Conventional novolak resists for storage ring x-ray lithography
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Published:1983
Issue:4
Volume:1
Page:1072
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:en
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
7 articles.
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1. X-ray mask repair with focused ion beams;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1990-11
2. Radiation Exposure;Semiconductor Lithography;1988
3. Positive Radiation Resists;Semiconductor Lithography;1988
4. Developing Resist Images;Semiconductor Lithography;1988
5. X-ray exposure characteristics of diazo-type photoresist using synchrotron radiation;Microelectronic Engineering;1986-01