Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

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Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy

Published:2016-01 Issue:1 Volume:34 Page:01A111
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Dhakal Dileep,Assim Khaybar,Lang Heinrich,Bruener Philipp,Grehl Thomas,Georgi Colin,Waechtler Thomas,Ecke Ramona,Schulz Stefan E.,Gessner Thomas

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4933088

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Selective spatial atomic layer deposition of Cu, Cu2O, and CuO thin films in the open air: reality or fiction?;Materials Today Chemistry;2023-04

2. In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes;Journal of Vacuum Science & Technology A;2023-03

3. Open-air printing of Cu2O thin films with high hole mobility for semitransparent solar harvesters;Communications Materials;2021-07-20

4. Future perspectives of perovskite solar cells: Metal oxide-based inorganic hole-transporting materials;Sustainable Materials for Next Generation Energy Devices;2021

5. Atomic Layer Deposition of Superconducting CuO Thin Films on Three-Dimensional Substrates;Crystals;2020-07-29

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