Atomic Layer Deposition of Superconducting CuO Thin Films on Three-Dimensional Substrates

Abstract

In previous decades, investigation of superconductors was aimed either at finding materials with higher critical temperatures or at discovering nontypical superconducting behavior. Here, we present the cupric (CuO) thin films, which were synthesized by atomic layer deposition by using a metal-organic precursor, copper (II)-bis-(-dimethylamino-2-propoxide), and ozone as an oxidizer. The deposition process was optimized by employing a quartz crystal monitoring, and the contact between the deposited films and planar and three-dimensional SiO2/Si substrates was examined by scanning electron microscopy with a focused ion beam module. Phase and elemental composition were analyzed by X-ray diffraction and X-ray fluorescence. Two-probe electrical resistivity measurements revealed a resistivity drop below the critical temperature of 4 K, which may indicate low-temperature superconductivity of the CuO thin films.