Reactive-ion-beam etching of InP in a chlorine–hydrogen mixture-Reference-Cited by-同舟云学术

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Reactive-ion-beam etching of InP in a chlorine–hydrogen mixture

Published:1994-11 Issue:6 Volume:12 Page:3374
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Vawter G. Allen

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication;Micromachines;2021-08-20

2. Fabrication of self-masked InP nanopillars by electron cyclotron resonance ion etching;Physica E: Low-dimensional Systems and Nanostructures;2012-04

3. Solid Source Dry Etching Process for GaAs and InP;Japanese Journal of Applied Physics;2006-10-24

4. Semiconductors, Compound;Kirk-Othmer Encyclopedia of Chemical Technology;2006-09-15

5. Room-Temperature Inductively Coupled Plasma Etching of InP Using Cl 2 /N 2 and Cl 2 /CH 4 /H 2;Chinese Physics Letters;2006-03-30

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