Fabrication of self-masked InP nanopillars by electron cyclotron resonance ion etching-Reference-Cited by-同舟云学术

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Fabrication of self-masked InP nanopillars by electron cyclotron resonance ion etching

Published:2012-04 Issue:7-8 Volume:44 Page:1644-1648
ISSN:1386-9477
Container-title:Physica E: Low-dimensional Systems and Nanostructures
language:en
Short-container-title:Physica E: Low-dimensional Systems and Nanostructures

Author:

Paramanik Dipak,Suzuki T.,Ikeda N.,Nagai T.,Van Haesendonck C.

Publisher

Elsevier BV

Subject

Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Nanoparticle Arrays on Surfaces for Electronic, Optical, and Sensor Applications

2. One-dimensional heterostructures in semiconductor nanowhiskers

3. Nanowire photonics

4. Nanoelectronics from the bottom up

5. Semiconductor nanolasers

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent developments in ion beam-induced nanostructures on AIII-BV compound semiconductors;Journal of Physics: Condensed Matter;2018-07-05

2. Thermally controlled growth of surface nanostructures on ion-modified AIII-BV semiconductor crystals;Applied Surface Science;2018-01

3. Correlation of III/V semiconductor etch results with physical parameters of high-density reactive plasmas excited by electron cyclotron resonance;Plasma Science and Technology;2017-10-24

4. Design and analysis of all-dielectric subwavelength focusing flat lens;Journal of Physics D: Applied Physics;2017-08-30

5. Nanocone formation on ion-bombarded InP surfaces;Applied Surface Science;2015-11

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