Room-Temperature Inductively Coupled Plasma Etching of InP Using Cl 2 /N 2 and Cl 2 /CH 4 /H 2
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Reference29 articles.
1. Fabrication of InGaAs/InP avalanche photodiodes by reactive ion etching using CH4/H2 gases
2. Fabrication of InGaAsP/InP buried heterostructure laser using reactive ion etching and metalorganic chemical vapor deposition
3. Electron-cyclotron resonance etching of mirrors for ridge-guided lasers
4. Fabrication of InP Submicron Pillars for Two-Dimensional Photonic Crystals by Reactive Ion Etching
5. InGaAsP-InP nanoscale waveguide-coupled microring lasers with submilliampere threshold current using Cl/sub 2/--N/sub 2/-based high-density plasma etching
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1. Room temperature inductively coupled plasma etching of InP with Cl2 mixtures using SiO2 and photoresist masks;Journal of Vacuum Science & Technology B;2024-02-14
2. Plasma etching for fabrication of complex nanophotonic lasers from bonded InP semiconductor layers;Micro and Nano Engineering;2023-06
3. Systematic study of InP/InGaAsP heated plasma etching and roughness improvement for integrated optical devices;Journal of Vacuum Science & Technology B;2023-01-01
4. The Method of Low-Temperature ICP Etching of InP/InGaAsP Heterostructures in Cl2-Based Plasma for Integrated Optics Applications;Micromachines;2021-12-10
5. Low temperature ICP etching of InP/InGaAsP heterostructure in Cl2-based plasma;Journal of Physics: Conference Series;2019-11-01
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