Radio frequency plasma annealing of positive charge generated by Fowler–Nordheim electron injection in buried oxides in silicon
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. RF Plasma Monolayer Doping of Si Nanowires;2019 IEEE 9th International Conference Nanomaterials: Applications & Properties (NAP);2019-09
2. Modification of MIS Devices by Radio-Frequency Plasma Treatment;Acta Physica Polonica A;2019-08
3. Effect of Low Temperature RF Plasma Treatment on Electrical Properties of Junctionless InGaAs MOSFETs;ECS Journal of Solid State Science and Technology;2019
4. Enhanced recrystallization and dopant activation of P+ion-implanted super-thin Ge layers by RF hydrogen plasma treatment;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-09
5. RF plasma treatment of shallow ion-implanted layers of germanium;Materials Science in Semiconductor Processing;2016-02
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