Design for electron beam: A novel approach to electron beam direct writing throughput enhancement for volume production-Reference-Cited by-同舟云学术

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Design for electron beam: A novel approach to electron beam direct writing throughput enhancement for volume production

Published:2009 Issue:6 Volume:27 Page:2532
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Maruyama Takashi,Machida Yasuhide,Sugatani Shinji,Tsuchikawa Haruo,Hoshino Hiromi,Ito Masaru,Tago Haruyuki,Chau Larry L.,Lee Shone,Komami Hideaki

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Structured Routing Architecture for Practical Application of Character Projection Method in Electron-Beam Direct Writing;IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences;2014

2. Potential of mask production process for finer pattern fabrication;SPIE Proceedings;2013-09-09

3. High-Throughput Electron Beam Direct Writing of VIA Layers by Character Projection with One-Dimensional VIA Characters;IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences;2013

4. Characterization of Fogging and Develop-Loading Effects in Electron-Beam Direct-Writing Technology;Japanese Journal of Applied Physics;2012-06-20

5. Characterization of Fogging and Develop-Loading Effects in Electron-Beam Direct-Writing Technology;Japanese Journal of Applied Physics;2012-06-01

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