Surface chemistry of a Cu(I) beta-diketonate precursor and the atomic layer deposition of Cu2O on SiO2 studied by x-ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

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Surface chemistry of a Cu(I) beta-diketonate precursor and the atomic layer deposition of Cu2O on SiO2 studied by x-ray photoelectron spectroscopy

Published:2014-07 Issue:4 Volume:32 Page:041505
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Dhakal Dileep,Waechtler Thomas,Schulz Stefan E.,Gessner Thomas,Lang Heinrich,Mothes Robert,Tuchscherer André

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4878815

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis and comparison of copper precursor using aminoalkoxide for copper containing thin films and nanomaterials;Journal of Organometallic Chemistry;2024-10

2. Atomic layer deposition of Cu2O using copper acetylacetonate;Journal of Vacuum Science & Technology A;2023-02-02

3. On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates;Journal of Vacuum Science & Technology A;2022-05

4. Direct synthesis of tetraalkoxysilanes in a high-pressure mechanochemical reactor;Reaction Chemistry & Engineering;2022

5. Atomic Layer Deposition of Superconducting CuO Thin Films on Three-Dimensional Substrates;Crystals;2020-07-29

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