Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide-Reference-Cited by-同舟云学术

Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide

Published:2021-09 Issue:5 Volume:39 Page:052408
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Kröncke Hanno¹,Maudet Florian¹^ORCID,Banerjee Sourish¹^ORCID,Albert Jürgen¹,Wiesner Sven¹^ORCID,Deshpande Veeresh¹^ORCID,Dubourdieu Catherine¹²

Affiliation:

1. Helmholtz-Zentrum-Berlin für Materialien und Energy GmbH, Institute “Functional Oxides for Energy Efficient Information Technology,” Hahn-Meitner-Platz 1, 14109 Berlin, Germany

2. Physical Chemistry, Freie Universität Berlin, Arnimallee 22, 14195 Berlin, Germany

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001207

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