Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry-Reference-Cited by-同舟云学术

Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry

Published:2020-03 Issue:2 Volume:38 Page:024007
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Korde Madhulika¹^ORCID,Kal Subhadeep²,Alix Cheryl²,Keller Nick³,Antonelli G. Andrew⁴,Mosden Aelan²,Diebold Alain C.¹

Affiliation:

1. College of Nanoscale Science and Engineering, SUNYPolytechnic Institute, 257 Fuller Rd., Albany, New York 12203

2. TEL Technology Center, America, LLC, NanoFab 300 South 255 Fuller Road, Suite 214, Albany, New York 12203

3. Nanometrics, 550 Buckeye Drive, Milpitas, California 95035

4. Onto Innovation, 16 Jonspin Road, Wilmington, Massachusetts 01887

Funder

Semiconductor Research Corporation

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5136291

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