Superlattice effects and limitations of non-destructive measurement of advanced Si/Si(1-x)Ge(x) superlattice structures using Mueller matrix scatterometry (MMSE) and high-resolution x-ray diffraction (XRD)
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SPIE
Reference26 articles.
1. “International Roadmap for Devices and Systems: Metrology,” Institute of Electrical and Electronics Engineers (2022).
2. “International Roadmap for Devices and Systems: More Moore,” Institute of Electrical and Electronics Engineers (2022).
3. Metrology for the next generation of semiconductor devices
4. 2019 IEEE International Electron Devices Meeting (IEDM)
5. 4-Levels Vertically Stacked SiGe Channel Nanowires Gate-All-Around Transistor with Novel Channel Releasing and Source and Drain Silicide Process
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