Effects of ultraviolet illumination on dry etch rates of NiFe-based magnetic multilayers-Reference-Cited by-同舟云学术

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Effects of ultraviolet illumination on dry etch rates of NiFe-based magnetic multilayers

Published:2000-07 Issue:4 Volume:18 Page:1273-1277
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Cho H.,Lee K. P.,Hahn Y. B.,Lambers E. S.,Pearton S. J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.582339

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma etching: Yesterday, today, and tomorrow;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-09

2. Theoretical Study of Atomic Level Understanding of the Reactive Ion Etching (RIE);Journal of Computational and Theoretical Nanoscience;2012-08-01

3. Magnetic mesa-structure array for ensemble detection applications of nuclear spins;Micro & Nano Letters;2011

4. First-principles calculations-based model for the reactive ion etching of metal oxide surfaces;Vacuum;2008-10

5. Applying computational nanomaterials design to the reactive ion etching of NiO thin films—a preliminary investigation;Journal of Physics: Condensed Matter;2007-08-24

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