Applying computational nanomaterials design to the reactive ion etching of NiO thin films—a preliminary investigation
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,General Materials Science
Link
http://stacks.iop.org/0953-8984/19/i=36/a=365210/pdf
Reference15 articles.
1. High-Performance and Damage-Free Magnetic Film Etching using Pulse-Time-Modulated Cl2Plasma
2. Effects of ultraviolet illumination on dry etch rates of NiFe-based magnetic multilayers
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