Author:
Craver B.,Roy A.,Nounu H.,Wolfe J. C.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by
5 articles.
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1. Applications of the Technology of Fast Neutral Particle Beams in Micro- and Nanoelectronics;Russian Microelectronics;2018-09
2. Image noise in helium lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-07
3. Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2009
4. Neutral particle proximity lithography: Noncontact nanoscale printing without charge-related artifacts;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008-11
5. Neutral particle lithography: a simple solution to charge-related artefacts in ion beam proximity printing;Journal of Physics D: Applied Physics;2008-01-04