Neutral particle lithography: a simple solution to charge-related artefacts in ion beam proximity printing
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/41/i=2/a=024007/pdf
Reference53 articles.
1. Imprints offer Moore
2. PREVAIL-EPL alpha tool: Early results
3. Ion projection lithography: International development program
4. Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic
5. Cost of ownership analysis for patterning using step and flash imprint lithography
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