Image noise in helium lithography-Reference-Cited by-同舟云学术

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Image noise in helium lithography

Published:2011-07 Issue:4 Volume:29 Page:041005
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Roy Ananya,Craver Barry,Ocola Leonidas E.,Wolfe John C.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3597835

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Applications of the Technology of Fast Neutral Particle Beams in Micro- and Nanoelectronics;Russian Microelectronics;2018-09

2. Resist Assisted Patterning;Helium Ion Microscopy;2016

3. Dependency analysis of line edge roughness in electron-beam lithography;Microelectronic Engineering;2015-02

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